Aqueous cleaning composition and method for using same
US7879782B2 · kind B2 · utility
7Cited by
19References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 13, 2005 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Jun 19, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An aqueous-based composition and method comprising same for removing residues such as without limitation post-ashed and/or post-etched photoresist from a substrate is described herein. In one aspect, there is provided a composition for removing residues comprising: water; at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures thereof; and a corrosion inhibitor wherein the composition is substantially free of an added organic solvent and provided that the corrosion inhibitor does not contain a water soluble organic acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.