Cleaning composition for semiconductor substrates
US7879783B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 11, 2007 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Sep 4, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to a semi-aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from semiconductor substrates. The cleaning composition comprises a buffering system comprising a polyprotic acid having at least three carboxylic acid groups with a pKa value of about 5 to about 7. The composition also comprises a polyhydric solvent, such as glycerol. A fluoride ion source is also included in the cleaning compositions of the present invention and is principally responsible for removing inorganic residues from the substrate. The cleaning compositions of the present invention have a low toxicity and are environmentally acceptable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.