Extreme ultra violet light source apparatus
US7880153B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2008 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Aug 13, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.