Lithographic apparatus and device manufacturing method
US7880860B2 · kind B2 · utility
20Cited by
45References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2004 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Jan 4, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.