Patent · US Active

Method and device for mutual contacting of two wafers

US7882997B2 · kind B2 · utility

7Cited by
7References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 11, 2005
Grant dateFeb 8, 2011
Priority date
Expiry dateAug 31, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/19043
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method and a device for the mutual contacting of two wafer-type component composite configurations made of multiple identical components which are implemented coherently, in particular a semiconductor wafer (12) with a functional component wafer (14), to produce electronic assemblies on the wafer level, in which the component composite configurations are each situated on a receptacle unit (11; 13) and the contact pressure necessary for the contacting between contact metallizations of the component composite configurations to be connected to one another is generated in such a way that a vacuum is generated in a contact chamber which receives the component composite configurations and is delimited by the receptacle units, and the contacting of the contact metallizations is performed by a rear energy impingement of a component composite configuration.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.