Substrate processing apparatus and lid supporting apparatus for the substrate processing apparatus
US7883579B2 · kind B2 · utility
5Cited by
7References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 21, 2006 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Apr 7, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus which enables the work efficiency of maintenance to be improved. The substrate processing apparatus comprises a plurality of processing chambers 100 for carrying out plasma processing on a wafer to be processed. Each processing chamber 100 has a chamber lid 200 that can be suspended and supported by a crane unit 500. The crane unit 500 comprises an air cylinder 510 and a linear guide 520. The air cylinder 510 holds the chamber lid 200 movably in a vertical direction thereabove. The linear guide 520 holds the chamber lid 200 movably in a horizontal direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.