Patent · US Active

Gallium nitride layer with diamond layers

US7884373B2 · kind B2 · utility

10Cited by
6References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 2, 2010
Grant dateFeb 8, 2011
Priority date
Expiry dateApr 2, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D62/8303
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

In one aspect, a method includes fabricating a gallium nitride (GaN) layer with a first diamond layer having a first thermal conductivity and a second diamond layer having a second thermal conductivity greater than the first thermal conductivity. The fabricating includes using a microwave plasma chemical vapor deposition (CVD) process to deposit the second diamond layer onto the first diamond layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.