Gallium nitride layer with diamond layers
US7884373B2 · kind B2 · utility
10Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2010 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Apr 2, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/8303
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
In one aspect, a method includes fabricating a gallium nitride (GaN) layer with a first diamond layer having a first thermal conductivity and a second diamond layer having a second thermal conductivity greater than the first thermal conductivity. The fabricating includes using a microwave plasma chemical vapor deposition (CVD) process to deposit the second diamond layer onto the first diamond layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.