Patent · US Active

Techniques for independently controlling deflection, deceleration and focus of an ion beam

US7888653B2 · kind B2 · utility

29Cited by

14References

28Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

Peter L. Kellerman · Essex, US
Svetlana B. Radovanov · Marblehead, US
Frank Sinclair · Quincy, US
Victor M. Benveniste · Gloucester, US

Key dates

Filing date	Jan 2, 2009
Grant date	Feb 15, 2011
Priority date	—
Expiry date	Oct 4, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3171
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.