Peter L. Kellerman
60Patents
12h-index
62Co-inventors
87Inventor score
Filing activity: Sep 27, 1991 → Aug 9, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6237527A | System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate | Electricity | 230 | Expired |
| US6101971A | Ion implantation control using charge collection, optical emission spectroscopy and mass analysis | Electricity | 91 | Expired |
| US6050218A | Dosimetry cup charge collection in plasma immersion ion implantation | Electricity | 52 | Expired |
| US6305316A | Integrated power oscillator RF source of plasma immersion ion implantation system | Electricity | 48 | Expired |
| US5780863A | Accelerator-decelerator electrostatic lens for variably focusing and mass resolving an ion beam in an ion implanter | Electricity | 32 | Expired |
| US6458430B1 | Pretreatment process for plasma immersion ion implantation | Electricity | 30 | Expired |
| US7888653B2 | Techniques for independently controlling deflection, deceleration and focus of an ion beam | Electricity | 29 | Active |
| US5856674A | Filament for ion implanter plasma shower | Electricity | 23 | Expired |
| US5198676A | Ion beam profiling method and apparatus | Electricity | 21 | Expired |
| US6946403B2 | Method of making a MEMS electrostatic chuck | Electricity | 19 | Expired |
| US6347919B1 | Wafer processing chamber having separable upper and lower halves | Emerging Cross-Sectional Technologies | 16 | Expired |
| US8129695B2 | System and method for controlling deflection of a charged particle beam within a graded electrostatic lens | Electricity | 13 | Active |
| US7072166B2 | Clamping and de-clamping semiconductor wafers on a J-R electrostatic chuck having a micromachined surface by using force delay in applying a single-phase square wave AC clamping voltage | Electricity | 12 | Expired |
| US6429139B1 | Serial wafer handling mechanism | Emerging Cross-Sectional Technologies | 12 | Expired |
| US7855087B2 | Floating sheet production apparatus and method | Chemistry; Metallurgy | 11 | Active |
| US7033443B2 | Gas-cooled clamp for RTP | Emerging Cross-Sectional Technologies | 10 | Expired |
| US8519353B2 | Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam | Electricity | 9 | Active |
| US5909031A | Ion implanter electron shower having enhanced secondary electron emission | Electricity | 9 | Expired |
| US5903009A | Biased and serrated extension tube for ion implanter electron shower | Electricity | 9 | Expired |
| US7816153B2 | Method and apparatus for producing a dislocation-free crystalline sheet | Emerging Cross-Sectional Technologies | 7 | Active |
| US7019314B1 | Systems and methods for ion beam focusing | Electricity | 7 | Expired |
| US8475591B2 | Method of controlling a thickness of a sheet formed from a melt | Emerging Cross-Sectional Technologies | 6 | Active |
| US7675047B2 | Technique for shaping a ribbon-shaped ion beam | Electricity | 6 | Active |
| US6905984B2 | MEMS based contact conductivity electrostatic chuck | Emerging Cross-Sectional Technologies | 6 | Expired |
| US7421973B2 | System and method for performing SIMOX implants using an ion shower | Electricity | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.