Coordinate measuring machine and method for structured illumination of substrates
US7889338B2 · kind B2 · utility
2Cited by
3References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 27, 2008 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Dec 23, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A coordinate measuring machine for the structured illumination of substrates is disclosed. The incident light illumination means and/or the transmitted light illumination means have a pupil access via which at least one optical element is positionable in the optical illumination path. The size and/or type and/or the polarization of the pupil illumination may be manipulated such that the structured illumination of the substrate in the coordinate measuring machine corresponds to the structured illumination of this substrate in the exposure process with a stepper.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.