Two grating lateral shearing wavefront sensor
US7889356B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 8, 2009 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Dec 8, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2009/0219
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods include simultaneously diffracting a beam in a first direction and a second direction orthogonal to the first direction to form a once-diffracted beam, where the beam comprises a wavefront shaped by a test object, simultaneously diffracting the once-diffracted beam in orthogonal directions to form a twice-diffracted beam, overlapping at least two orders of the twice-diffracted beam in each direction to form an interference pattern at a detector, the interference pattern being formed by multiple copies of the wavefront laterally sheared in the first direction and multiple copies of the wavefront laterally sheared in the second direction; and determining information about the wavefront based on the interference pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.