Liquid processing apparatus
US7891366B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 13, 2007 |
| Grant date | Feb 22, 2011 |
| Priority date | — |
| Expiry date | Aug 30, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member, to rotate along with the substrate, and to receive the process liquid thrown off from the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup and an annular exhaust cup with an exhaust port connected thereto to discharge a collected gas component. A gas-flow adjusting mechanism is disposed between the exhaust cup and the exhaust port and configured to adjust a gas flow of the gas component to flow toward the exhaust port from essentially all around within the exhaust cup.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.