Lithographic apparatus and device manufacturing method
US7898642B2 · kind B2 · utility
17Cited by
23References
41Claims
0Family size
Assignee
Inventors
- Aleksey Yurievich Kolesnychenko
- Johannes Jacobus Matheus Baselmans
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Hans Jansen
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Felix Godfried Peter Peeters
- Bob Streefkerk
- Franciscus Johannes Herman Maria Teunissen
- Helmar Van Santen
Key dates
| Filing date | Apr 14, 2004 |
| Grant date | Mar 1, 2011 |
| Priority date | — |
| Expiry date | Jan 19, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.