Defect classification utilizing data from a non-vibrating contact potential difference sensor
US7900526B2 · kind B2 · utility
1Cited by
65References
21Claims
0Family size
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Key dates
| Filing date | Nov 30, 2007 |
| Grant date | Mar 8, 2011 |
| Priority date | — |
| Expiry date | Jul 31, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and system for identifying and classifying non-uniformities on the surface of a semiconductor or in a semiconductor. The method and system involves scanning the wafer surface with a non-vibrating contact potential difference sensor to detect the locations of non-uniformities, extracting features characteristic of the non-uniformities, and applying a set of rules to these features to classify the type of each non-uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.