Patent · US Active

Defect classification utilizing data from a non-vibrating contact potential difference sensor

US7900526B2 · kind B2 · utility

1Cited by
65References
21Claims
0Family size

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Key dates

Filing dateNov 30, 2007
Grant dateMar 8, 2011
Priority date
Expiry dateJul 31, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L22/14
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and system for identifying and classifying non-uniformities on the surface of a semiconductor or in a semiconductor. The method and system involves scanning the wafer surface with a non-vibrating contact potential difference sensor to detect the locations of non-uniformities, extracting features characteristic of the non-uniformities, and applying a set of rules to these features to classify the type of each non-uniformity.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.