Patent · US Active

Drop analysis system

US7901026B2 · kind B2 · utility

19Cited by
3References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 25, 2006
Grant dateMar 8, 2011
Priority date
Expiry dateMar 24, 2027

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB41J11/42
  • WIPO fieldTextile and paper machines
  • WIPO sectorMechanical engineering

Abstract

A drop analysis/drop check system allows a plurality of printheads to remain stationary during analysis to emulate operation of an actual piezoelectric microdeposition system. The system provides accurate tuning of individual nozzle ejectors and allows for substrate loading and alignment in parallel with drop analysis/drop check. The drop analysis/drop check system includes a motion controller directing movement of a stage, a printhead controller controlling a printhead to selectively eject drops of fluid material to be deposited on a substrate, and a camera supported by the stage for movement relative to the printheads. The camera receives a signal from the motion controller to initiate exposure of the camera and captures an image of the drops of fluid material ejected by the printheads. A light-emitting device includes a strobe controller that receives a signal from the camera to supply light to an area including the liquid drops during camera exposure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.