System and method for making photomasks
US7906253B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2007 |
| Grant date | Mar 15, 2011 |
| Priority date | — |
| Expiry date | May 11, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present disclosure is directed to a method for preparing photomask patterns for a lithography process that employs a plurality of photomasks. The method comprises receiving data describing a drawn pattern. An edge of the drawn pattern is identified that can be defined using a first photomask and a second photomask, and the first photomask is chosen for patterning the edge. Patterns are formed for the first photomask and the second photomask, wherein the first photomask pattern is formed to pattern the edge, and the second photomask pattern is formed to have a wing adjacent to the edge for protecting the edge from double patterning. A process for patterning an integrated circuit device is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.