Thomas J. Aton
58Patents
14h-index
49Co-inventors
84Inventor score
Filing activity: Mar 22, 1989 → Dec 19, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5751987A | Distributed processing memory chip with embedded logic having both data memory and broadcast memory | Physics | 546 | Expired |
| US5159752A | Scanning electron microscope based parametric testing method and apparatus | Emerging Cross-Sectional Technologies | 120 | Expired |
| US6787469B2 | Double pattern and etch of poly with hard mask | Electricity | 71 | Expired |
| US5396141A | Radioisotope power cells | Physics | 41 | Expired |
| US5361137A | Process control for submicron linewidth measurement | Physics | 32 | Expired |
| US5059897A | Method and apparatus for testing passive substrates for integrated circuit mounting | Physics | 32 | Expired |
| US6635916B2 | On-chip capacitor | Electricity | 31 | Expired |
| US5128612A | Disposable high performance test head | Physics | 30 | Expired |
| US6764795B2 | Method and system for mask pattern correction | Physics | 25 | Expired |
| US6897505B2 | On-chip capacitor | Electricity | 23 | Expired |
| US6634018B2 | Optical proximity correction | Physics | 23 | Expired |
| US7906253B2 | System and method for making photomasks | Emerging Cross-Sectional Technologies | 18 | Active |
| US4978908A | Scanning electron microscope based parametric testing method and apparatus | Physics | 16 | Expired |
| US5208531A | Apparatus and method for testing integrated circuits | Physics | 14 | Expired |
| US6553558B2 | Integrated circuit layout and verification method | Physics | 13 | Expired |
| US5053699A | Scanning electron microscope based parametric testing method and apparatus | Physics | 12 | Expired |
| US6724431B1 | Program network specific information for TV or radio | Electricity | 9 | Expired |
| US8446175B2 | Logic-cell-compatible decoupling capacitor | Electricity | 8 | Active |
| US10192859B2 | Integrated circuits and processes for protection of standard cell performance from context effects | Electricity | 8 | Active |
| US7927782B2 | Simplified double mask patterning system | Emerging Cross-Sectional Technologies | 7 | Active |
| US5406116A | Dopant implant for conductive charge leakage layer for use with voltage contrast | Emerging Cross-Sectional Technologies | 7 | Expired |
| US7984393B2 | System and method for making photomasks | Physics | 6 | Active |
| US6813757B2 | Method for evaluating a mask pattern on a substrate | Physics | 6 | Expired |
| US5929645A | Integrated circuit tester using ion beam | Physics | 6 | Expired |
| US6486525B1 | Deep trench isolation for reducing soft errors in integrated circuits | Electricity | 6 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.