Method and apparatus for providing a light absorbing mask in an interferometric modulator display
US7916378B2 · kind B2 · utility
11Cited by
69References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 8, 2007 |
| Grant date | Mar 29, 2011 |
| Priority date | — |
| Expiry date | Apr 29, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/001
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A microelectromechanical system (MEMS) is provided. In one embodiment, the MEMS includes a transparent substrate, and a plurality of interferometric modulators. The plurality of interferometric modulators includes an optical stack coupled to the transparent substrate, in which the optical stack includes a first light absorbing area. The plurality of interferometric modulators further includes a reflective layer over the optical stack, and one or more posts to support the reflective layer. Each of the one or more posts includes a second light absorbing area integrated in the post.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.