Patent · US Active

Apparatus for providing a pattern of polarization

US7916391B2 · kind B2 · utility

3Cited by

85References

37Claims

0Family size

Assignees

Carl Zeiss SMT GmbH · DE
ASML Holding N.V. · NL

Inventors

Michael Albert · Stamford, US
Damian Fiolka · Oberkochen, DE

Key dates

Filing date	Mar 4, 2005
Grant date	Mar 29, 2011
Priority date	—
Expiry date	Jul 10, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG02B27/286
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A polarization pattern assembly for use in an illuminator and an apparatus for providing at least one polarization pattern in a pupil of an illuminator for a lithography system are provided. A polarization pattern assembly for use in an illuminator having a pupil includes a frame (110) and at least one polarization pane (102, 102a, 102b) coupled to the frame (110), the polarization pane (102, 102a, 102b) changing a direction of polarization of light passing therethrough, whereby at least one polarization pattern is obtained across the pupil of the illuminator, and wherein the polarization pane (102, 102a, 102b) includes an optically active material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.