Methods, apparatus, and program products to optimize semiconductor product yield prediction for performance and leakage screens
US7917451B2 · kind B2 · utility
6Cited by
3References
20Claims
0Family size
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Key dates
| Filing date | Mar 11, 2008 |
| Grant date | Mar 29, 2011 |
| Priority date | — |
| Expiry date | Oct 17, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/333
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An apparatus, method, and program product are provided to predict yield loss associated with performance screens or leakage screens. A leakage model is correlated to an on-chip measurement. Current limited yields are determined from the leakage model. A database is formed relating performance sigma cut-points to the circuit limited yields. A product is quoted based on the circuit limited yield for one of the performance sigma cut-points taken from the database. The quote is tied to the product design and testing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.