Thermally stable multilayer mirror for the EUV spectral region
US7920323B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2005 |
| Grant date | Apr 5, 2011 |
| Priority date | — |
| Expiry date | Nov 15, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a multilayer mirror (1) for the reflection of EUV radiation containing a large number of alternating molybdenum layers (4) and silicon layers (3), a barrier layer (5) containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers (4) and the silicon layers (3). As a result of the barrier layers (5) of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300° C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror (1) of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.