Patent · US Active

Thermally stable multilayer mirror for the EUV spectral region

US7920323B2 · kind B2 · utility

6Cited by
6References
22Claims
0Family size

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Key dates

Filing dateDec 23, 2005
Grant dateApr 5, 2011
Priority date
Expiry dateNov 15, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG21K2201/067
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

In a multilayer mirror (1) for the reflection of EUV radiation containing a large number of alternating molybdenum layers (4) and silicon layers (3), a barrier layer (5) containing a silicon nitride or a silicon boride is included at a number of interfaces between the molybdenum layers (4) and the silicon layers (3). As a result of the barrier layers (5) of a silicon nitride or of a silicon boride, high thermal stability is achieved, in particular high long-term stability at temperatures of more than 300° C., whilst at the same time achieving high reflectivity in the multilayer mirror. A multilayer mirror (1) of this type can, in particular, be used as a heatable collector mirror for an EUV radiation source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.