Reduction projection objective and projection exposure apparatus including the same

US7920338B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Wilhelm Ulrich · Aalen, DE
• Aurelian Dodoc · Heidenheim an der Brenz, DE

Key dates

• Filing date: Mar 22, 2007
• Grant date: Apr 5, 2011
• Expiry date: Jan 3, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70275
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A reduction projection objective for projection lithography has a plurality of optical elements arranged along an optical axis and designed for imaging an effective object field arranged in an object surface of the projection objective into an effective image field arranged in an image surface of the projection objective at a reducing magnification ratio. The optical elements include at least one concave mirror. The optical elements are designed to provide an image-side numerical aperture NA>0.6 in a large effective image field having a maximum image field height Y′>25 mm. A compact, low mass projection objective enabling high throughput of exposed substrates is thereby obtained.