CD-GISAXS system and method
US7920676B2 · kind B2 · utility
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28References
71Claims
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Key dates
| Filing date | Jul 6, 2007 |
| Grant date | Apr 5, 2011 |
| Priority date | — |
| Expiry date | Dec 14, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
CD-GISAXS achieves reduced measurement times by increasing throughput using longer wavelength radiation (˜12×, for example) such as x-rays in reflective geometry to increase both the collimation acceptance angle of the incident beams and the scattering signal strength, resulting in a substantial combined throughput gain. This wavelength selection and geometry can result in a dramatic reduction in measurement time. Furthermore, the capabilities of the CD-GISAXS can be extended to meet many of the metrology needs of future generations of semiconductor manufacturing and nanostructure characterization, for example.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.