Substrate processing apparatus and substrate processing method
US7923380B2 · kind B2 · utility
0Cited by
0References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2009 |
| Grant date | Apr 12, 2011 |
| Priority date | — |
| Expiry date | Sep 11, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus includes a processing chamber that processes a substrate, and a substrate placing base enclosed in the processing chamber, and a substrate transporting member that allows the substrate to wait temporarily on the substrate placing base, and exhaust holes provided so as to surround the substrate placing base, and a retracting space that allows the substrate transporting member to move in between lines each connecting the exhaust hole and an upper end of the substrate placing base and the substrate placing base.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.