Lithographic apparatus, and device manufacturing method
US7928412B2 · kind B2 · utility
Assignee
Inventors
- Maarten Marinus Johannes Wilhelmus Van Herpen
- Vadim Yevgenyevich Banine
- Johannes Peterus Henricus De Kuster
- Johannes Hubertus Josephina Moors
- Lucas Henricus Johannes Stevens
- Bastiaan Theodoor Wolschrijn
- Yurii Victorovitch Sidelnikov
- Marc Hubertus Lorenz Van Der Velden
- Wouter Anthon Soer
- Thomas Stein
- Kurt Gielissen
Key dates
| Filing date | Mar 17, 2009 |
| Grant date | Apr 19, 2011 |
| Priority date | — |
| Expiry date | Mar 26, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.