Solvent for cleaning
US7932221B2 · kind B2 · utility
0Cited by
3References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2005 |
| Grant date | Apr 26, 2011 |
| Priority date | — |
| Expiry date | Apr 1, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A solvent for cleaning that offers particularly superior results for cleaning pigment-dispersed photosensitive resin compositions used for forming color filters and black matrix patterns. The solvent for cleaning has a hydrogen bonding parameter (δH) among the Hansen solubility parameters that falls within a range from 5 to 10.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.