Akira Katano
5Patents
2h-index
11Co-inventors
37Inventor score
Filing activity: Apr 1, 2002 → Jul 7, 2005
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6756178B2 | Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process | Physics | 2 | Expired |
| US6762005B2 | Positive photoresist composition and method of patterning resist thin film for use in inclined implantation process | Physics | 2 | Expired |
| US6869742B2 | Positive photoresist composition | Physics | 2 | Expired |
| US6730769B2 | Novolak resin, production process thereof and positive photoresist composition using the novolak resin | Chemistry; Metallurgy | 1 | Expired |
| US7932221B2 | Solvent for cleaning | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.