Magnetic mirror plasma source and method using same
US7932678B2 · kind B2 · utility
40Cited by
38References
23Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 13, 2004 |
| Grant date | Apr 26, 2011 |
| Priority date | — |
| Expiry date | Jan 14, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3402
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A magnetic mirror plasma source includes a gap separating a substrate from a cathode. A mirror magnetic field extends between the substrate and the cathode through the gap. The magnetic field lines at a proximal surface of the substrate are at least two times as strong as those field lines entering the cathode. An anode is disposed such that a closed loop electron Hall current containment region is formed within the magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.