GENERAL PLASMA INC.
12Patents
12Active
12Granted
47Portfolio score
Filing activity: Sep 13, 2004 → Jun 13, 2016 · 5 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7932678B2 | Magnetic mirror plasma source and method using same | Electricity | 40 | Active |
| US7993496B2 | Cylindrical target with oscillating magnet for magnetron sputtering | Electricity | 4 | Active |
| US9136086B2 | Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith | Electricity | 3 | Active |
| US10989343B2 | Push-to-connect and pull-to-disconnect quick coupling | Mechanical Engineering; Lighting; Heating | 2 | Active |
| US8304744B2 | Closed drift ion source | Electricity | 2 | Active |
| US10134557B2 | Linear anode layer slit ion source | Electricity | 2 | Active |
| US8535490B2 | Rotatable magnetron sputtering with axially movable target electrode tube | Electricity | 2 | Active |
| US9388490B2 | Rotary magnetron magnet bar and apparatus containing the same for high target utilization | Electricity | 1 | Active |
| US11092245B2 | Chamber valve | Mechanical Engineering; Lighting; Heating | 0 | Active |
| US9103018B2 | Sputtering target temperature control utilizing layers having predetermined emissivity coefficients | Electricity | 0 | Active |
| US10811236B2 | Magnetic anode for sputter magnetron cathode | Electricity | 0 | Active |
| US10273570B2 | Rotary magnetron magnet bar and apparatus containing the same for high target utilization | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.