Microelectromechanical system and process of making the same
US7935556B2 · kind B2 · utility
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4Claims
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Key dates
| Filing date | Aug 27, 2007 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Aug 27, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0728
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A micro electromechanical system and a fabrication method thereof, which has trenches formed on a substrate to prevent circuits from interfering each other, and to prevent over-etching of the substrate when releasing a microstructure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.