Lithographic apparatus and device manufacturing method
US7936443B2 · kind B2 · utility
2Cited by
18References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 9, 2006 |
| Grant date | May 3, 2011 |
| Priority date | — |
| Expiry date | Mar 12, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0274
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.