Patent · US Active

Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors

US7947639B2 · kind B2 · utility

1Cited by
2References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateFeb 1, 2005
Grant dateMay 24, 2011
Priority date
Expiry dateJul 28, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/426
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.