Radiation source and lithographic apparatus
US7952084B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 28, 2009 |
| Grant date | May 31, 2011 |
| Priority date | — |
| Expiry date | Dec 16, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a plasma formation site located at a position in which a fuel is contacted by a beam of radiation to form a plasma, a collector constructed and arranged to collect extreme ultraviolet radiation formed at the plasma formation site and form an extreme ultraviolet radiation beam, and a contamination barrier. The contamination barrier includes a plurality of foils at least partially located between the plasma formation site and the collector, and a rotatable base operatively connected to the plurality of foils. The rotatable base is configured to allow the beam of radiation to pass through the contamination barrier to the plasma formation site.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.