Methods of arranging mask patterns responsive to assist feature contribution to image intensity and associated apparatus
US7954073B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 30, 2008 |
| Grant date | May 31, 2011 |
| Priority date | — |
| Expiry date | Sep 2, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus are disclosed that arrange mask patterns in response to the contribution of an assist feature to image intensity. In some methods of arranging mask patterns, a distribution of functions h(ξ−x) is obtained which represents the contribution of an assist feature to image intensity on a main feature. Neighboring regions of the main feature are discretized into finite regions, and the distribution of the functions h(ξ−x) is replaced with representative values h(x,ξ) of the discretized regions. A position of the assist feature is determined using polygonal regions having the same h(x,ξ). As described, the term x is the position of the main feature and the term ξ is the position of the assist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.