Independently-addressable, self-correcting inking for cantilever arrays
US7954166B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2008 |
| Grant date | May 31, 2011 |
| Priority date | — |
| Expiry date | Apr 5, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q80/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An improved method of loading tips and other surfaces with patterning compositions or inks for use in deposition. A method of patterning is described, the method comprising: (i) providing at least one array of tips; (ii) providing a plurality of patterning compositions; (iii) ink jet printing at least some of the patterning compositions onto some of the tips; and (iv) depositing at least some of the patterning compositions onto a substrate surface; wherein the ink jet printing is adapted to prevent substantial cross-contamination of the patterning composition on the tips. Good printing reproducibility and control of printing rate can be achieved. The surfaces subjected to ink jet printing can be treated to encourage localization of the ink at the tip. The method is particularly important for high density arrays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.