Compound, acid generator, resist composition and method of forming resist pattern
US7955777B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2008 |
| Grant date | Jun 7, 2011 |
| Priority date | — |
| Expiry date | Apr 11, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
There are provided a compound represented by a general formula (b1-1) shown below suitable as an acid generator for a resist composition, a compound represented by a general formula (I) shown below suitable as a precursor for the compound represented by the general formula (b1-1), an acid generator, a resist composition, and a method of forming a resist pattern.[Chemical Formula 1]X—Q1—Y1—SO3−M+ (I)X—Q1—Y1—SO3−A+ (b1-1)(wherein, Q1 represents a bivalent linking group or a single bond; Y1 represents an alkylene group which may contain a substituent group or a fluorinated alkylene group which may contain a substituent group; X represents an aromatic cyclic group of 5 to 30 carbon atoms which contains a fluorine atom and may contain a substituent group; M+ represents an alkali metal ion; and A+ represents an organic cation.).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.