Pattern generator
US7957055B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 28, 2010 |
| Grant date | Jun 7, 2011 |
| Priority date | — |
| Expiry date | Apr 28, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N2201/0414
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a digital description of the pattern to be written, converting the pattern to modulator signals, and feeding the signals to the modulator. An electronic control system may be provided to control a trigger signal to compensate for flash-to-flash time jitter in the light source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.