Methods for normalizing error in photolithographic processes
US7957826B2 · kind B2 · utility
8Cited by
4References
4Claims
0Family size
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Key dates
| Filing date | Aug 21, 2007 |
| Grant date | Jun 7, 2011 |
| Priority date | — |
| Expiry date | Jan 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70558
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating parts using a photolithography system, includes: performing a search of normalization data for an estimated dose operating point; and using the estimated dose operating point for fabrication of new parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.