Patent · US Active

Methods for multi-material stereolithography

US7959847B2 · kind B2 · utility

27Cited by
42References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 19, 2009
Grant dateJun 14, 2011
Priority date
Expiry dateMay 21, 2029

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29C64/124
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Methods and systems of stereolithography for building cost-efficient and time-saving multi-material, multi-functional and multi-colored prototypes, models and devices configured for intermediate washing and curing/drying is disclosed including: laser(s), liquid and/or platform level sensing system(s), controllable optical system(s), moveable platform(s), elevator platform(s), recoating system(s) and at least one polymer retaining receptacle. Multiple polymer retaining receptacles may be arranged in a moveable apparatus, wherein each receptacle is adapted to actively/passively maintain a uniform, desired level of polymer by including a recoating device and a material fill/remove system. The platform is movably accessible to the polymer retaining receptacle(s), elevator mechanism(s) and washing and curing/drying area(s) which may be housed in a shielded enclosure(s). The elevator mechanism is configured to vertically traverse and rotate the platform, thus providing angled building, washing and curing/drying capabilities. A horizontal traversing mechanism may be included to facilitate manufacturing between components of SL cabinet(s) and/or alternative manufacturing technologies.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.