Patent · US Active

Methods of patterning a substrate

US7959975B2 · kind B2 · utility

53Cited by
40References
39Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 18, 2007
Grant dateJun 14, 2011
Priority date
Expiry dateDec 20, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24802
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method of patterning a substrate is disclosed. An ink material is chemisorbed to at least one region of a stamp and the chemisorbed ink material is transferred to a receptor substrate. The ink material has greater chemical affinity for the receptor substrate than for the at least one region of the stamp. A method of forming the stamp is also disclosed, as are the stamp and a patterning system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.