Patent · US Active

Coordinate measuring machine for measuring structures on a substrate

US7961334B2 · kind B2 · utility

0Cited by

8References

5Claims

0Family size

Assignee

Vistec Semiconductor Systems GmbH · DE

Inventors

Hans-Artur Boesser · Breidenbach, DE
Michael Heiden · Blieskastel, DE
Klaus-Dieter Adam · Jena, DE

Key dates

Filing date	Jul 29, 2008
Grant date	Jun 14, 2011
Priority date	—
Expiry date	Jul 9, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/681
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A coordinate measuring machine (1) for measuring structures (3) on a substrate (2) including a measurement table (20) movable in the X-coordinate direction and in the Y-coordinate direction, a measurement objective (9), at least one laser interferometer (24) for determining the position of the measurement table (20) and the measurement objective (9) wherein the measurement table (20), the measurement objective (9) and the at least one laser interferometer (24) are arranged in a vacuum chamber (50).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.