Patent · US Active

Electronic design for integrated circuits based on process related variations

US7962867B2 · kind B2 · utility

199Cited by
90References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 28, 2008
Grant dateJun 14, 2011
Priority date
Expiry dateJul 25, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/3212
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An electronic design is generated for an integrated circuit that is to be fabricated in accordance with the electronic design by a process that will impart topographically induced feature dimension variations to the integrated circuit. The generating includes adjusting the electronic design based on predictions of topographical and topographical-related feature dimension variations by a pattern-dependent model. An RC extraction tool is used in conjunction with the generating and adjusting of the electronic design. The process includes a fabrication process that will impart topographical variation to the integrated circuit and a lithography or etch process. Placement attributes for elements of the integrated circuit are determined.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.