Via structure to improve routing of wires within an integrated circuit
US7962881B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2008 |
| Grant date | Jun 14, 2011 |
| Priority date | — |
| Expiry date | May 25, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/392
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
In consideration for the fact that a connection on the upper layers of an integrated circuit needs to access a lower layer to connect to, e.g., a transistor, at least one via on each layer is required below the top layer used by a connection for each pin. The vias (i.e., the connection structures between wiring planes within an integrated circuit) are arranged such that the number of wiring resources blocked on the lower layers is reduced. Various rules govern which vias are chosen. The main characteristic is to elect only a certain number of wiring channels appropriate for the vias on a single layer and then apply an optimization within the restricted elected wiring channels on that layer to select the most appropriate vias.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.