Lithographic apparatus and device manufacturing method
US7969550B2 · kind B2 · utility
2Cited by
4References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 19, 2007 |
| Grant date | Jun 28, 2011 |
| Priority date | — |
| Expiry date | May 29, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a shield device arranged between a source of air flows and/or pressure waves and an element sensitive for the air flows and/or pressure waves.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.