Method and system for evaluating an object that has a repetitive pattern
US7970577B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 6, 2008 |
| Grant date | Jun 28, 2011 |
| Priority date | — |
| Expiry date | Oct 3, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70616
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for evaluating placement errors within a lithographic mask, the method includes: providing or receiving a reference result that represents a distance between a reference pair of points of a reference element; measuring, for each pair of points out of multiple pairs of points that are associated with multiple spaced apart elements of the lithographic mask, the distance between the pair of points to provide multiple measurement results; wherein differences between a measurement result and the reference result are indicative of relative placement errors; and determining relative placement errors in response to relationships between the reference result and each of the measurement results.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.