Patent · US Active

Method for treating substrate, method for conveying substrate, and apparatus for conveying substrate

US7973907B2 · kind B2 · utility

0Cited by

7References

17Claims

0Family size

Assignee

Kabushiki Kaisha Toshiba · JP

Inventors

Kentaro Matsunaga · Yokkaichi, JP
Daisuke Kawamura · San Mateo, US
Seiro Miyoshi · Somalomo, CM
Eishi Shiobara · Yokohama, JP

Key dates

Filing date	Oct 30, 2008
Grant date	Jul 5, 2011
Priority date	—
Expiry date	Sep 30, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/16
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.