Patent · US Active

Metrology and registration system and method for laminography and tomography

US7974379B1 · kind B1 · utility

47Cited by

0References

24Claims

0Family size

Assignee

Xradia, Inc. · US

Inventors

Thomas A. Case · Walnut Creek, US
Wenbing Yun · Walnut Creek, US
Alan Francis Lyon · Berkeley, US

Key dates

Filing date	Sep 9, 2009
Grant date	Jul 5, 2011
Priority date	—
Expiry date	Feb 18, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG01N2223/419
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A metrology system that uses an imaging system to monitor alignment features on the sample or sample holder of an X-ray laminography or tomography system. the metrology system has the capability to provide both sample shift and sample rotation movement data to a data acquisition system. These shift and rotation data can be used in alignment routines to produce 3D reconstructions from the X-ray images/projections. The metrology system is based on an imaging and focusing measurement of intrinsic feature of the sample or artificial features fabricated on the sample or sample holder.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.