System for extraction of key process parameters from fault detection classification to enable wafer prediction
US7974728B2 · kind B2 · utility
49Cited by
22References
14Claims
0Family size
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Key dates
| Filing date | Feb 5, 2008 |
| Grant date | Jul 5, 2011 |
| Priority date | — |
| Expiry date | Jul 17, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B23/0221
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A system, method, and computer readable medium for extracting a key process parameter correlative to a selected device parameter are provided. In an embodiment, the key process parameter is determined using a gene map analysis. The gene map analysis includes grouping highly correlative process parameter and determining the correlation of a group to the selected device parameter. In an embodiment, the groups having greatest correlation to the selected device parameter are displayed in a correlation matrix and/or a gene map.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.