Method for detoxifying HCD gas and apparatus therefor
US7976807B2 · kind B2 · utility
1Cited by
2References
1Claims
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Key dates
| Filing date | Feb 6, 2007 |
| Grant date | Jul 12, 2011 |
| Priority date | — |
| Expiry date | Nov 28, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2257/204
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Hexachlorodisilane is decomposed into hydrochloric acid, silicon dioxide and water by introducing hexachlorodisilane-containing flue gas into a reaction region without moistening the flue gas and by supplying oxygen-containing gas that also contains a small amount of moisture to the reaction region maintained at a temperature at which hexachlorodisilane decomposes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.