Inventor · Toyama, JP

Katsuyoshi Harada

42Patents
6h-index
42Co-inventors
69Inventor score

Filing activity: Sep 26, 1990 → Jan 12, 2024

Most-cited inventions

PatentTitleAreaCited byStatus
US5985229A Solid silica derivative and process for producing the same Chemistry; Metallurgy 26 Expired
US5362897A Process for producing trialkoxysilanes Chemistry; Metallurgy 18 Expired
US9443718B2 Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium Electricity 11 Active
US5221412A Vapor-phase epitaxial growth process by a hydrogen pretreatment step followed by decomposition of disilane to form monocrystalline Si film Emerging Cross-Sectional Technologies 10 Expired
US10040884B2 Ethylene/α-olefin copolymers and lubricating oils Chemistry; Metallurgy 8 Active
US9620357B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 6 Active
US5260471A Process for producing trialkoxysilane Emerging Cross-Sectional Technologies 6 Expired
US10340134B2 Semiconductor device manufacturing method, substrate processing apparatus, and recording medium Electricity 4 Active
US10770287B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 4 Active
US10329366B2 Ethylene/α-olefin copolymers and lubricating oils Chemistry; Metallurgy 4 Active
US9190298B2 Film forming method and recording medium for performing the method Electricity 3 Active
US11527402B2 Method of processing substrate, substrate processing apparatus, recording medium, and method of manufacturing semiconductor device Electricity 2 Active
US10490400B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 2 Active
US10604842B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 1 Active
US9741555B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 1 Active
US7005532B2 Process of producing alkoxysilanes Chemistry; Metallurgy 1 Expired
US11961733B2 Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium Electricity 1 Active
US9520282B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 1 Active
US6664224B2 Quaternary ammonium salt and process for the preparation thereof Human Necessities 1 Expired
US9472397B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 1 Active
US6796874B2 Toy vehicle with shock absorbing steering mechanism Human Necessities 1 Expired
US7976807B2 Method for detoxifying HCD gas and apparatus therefor Performing Operations; Transporting 1 Active
US5556999A Alkoxysilane composition inhibited from disproportionation reaction Chemistry; Metallurgy 1 Expired
US10607833B2 Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium Electricity 1 Active
US9607827B2 Method of manufacturing semiconductor device, and recording medium Electricity 1 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.